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Physics > Applied Physics

arXiv:1704.06414 (physics)
[Submitted on 21 Apr 2017]

Title:Investigation of spin scattering mechanism in silicon channels of Fe/MgO/Si lateral spin valves

Authors:Soobeom Lee (1), Naoto Yamashita (1), Yuichiro Ando (1), Shinji Miwa (2), Yoshishige Suzuki (2), Hayato Koike (3), Masashi Shiraishi (1) ((1) Kyoto Univ., (2) Osaka Univ., (3) TDK Co.)
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Abstract:The temperature evolution of spin relaxation time, {\tau}sf, in degenerate silicon (Si)-based lateral spin valves is investigated by means of the Hanle effect measurements. {\tau}sf at 300 K is estimated to be 1.68+-0.03 ns and monotonically increased with decreasing temperature down to 100 K. Below 100 K, in contrast, it shows almost a constant value of ca. 5 ns. The temperature dependence of the conductivity of the Si channel shows a similar behavior to that of the {\tau}sf, i.e., monotonically increasing with decreasing temperature down to 100 K and a weak temperature dependence below 100 K. The temperature evolution of conductivity reveals that electron scattering due to magnetic impurities is negligible. A comparison between {\tau}sf and momentum scattering time reveals that the dominant spin scattering mechanism in the Si is the Elliott-Yafet mechanism, and the ratio of the momentum scattering time to the {\tau}sf attributed to nonmagnetic impurities is approximately 3.77*10^-6, which is more than two orders of magnitude smaller than that of copper.
Comments: 16 pages, 5 figures (to appear in Applied Physics Letters)
Subjects: Applied Physics (physics.app-ph); Materials Science (cond-mat.mtrl-sci); Other Condensed Matter (cond-mat.other); Quantum Physics (quant-ph)
Cite as: arXiv:1704.06414 [physics.app-ph]
  (or arXiv:1704.06414v1 [physics.app-ph] for this version)
  https://doi.org/10.48550/arXiv.1704.06414
arXiv-issued DOI via DataCite
Related DOI: https://doi.org/10.1063/1.4982966
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From: Masashi Shiraishi [view email]
[v1] Fri, 21 Apr 2017 06:41:55 UTC (643 KB)
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