A Python-based tool for modeling optical photolithography
current work on the project continues at
Desktop app for lithography learning available for Windows, macOS, and Linux
Lithography simulator
repo for the website of neural litho project
A CAM toolchain for making PCBs at home — one tool for the whole cycle, from Gerber/Excellon fab package to a finished board. UV photolithography today; CNC drilling, edge-cut routing & fiducials on the roadmap.
PolyHatch is an AutoCAD script written in lisp language to automate a basic photolithography photomask verification. The purpose of this scrip is to look for closed polylines within a given selection of drawings in a list of layers and hatch them.
High performance jax-based photolithography simulation.
Basic parameteric shapes to facilitate mask design in CleWin
Optical Proximity Correction (OPC) is a photolithography technique that modifies photomask geometry to counteract diffraction and process effects, ensuring accurate printing of patterns on the wafer. This work demonstrates a proof of concept showing how using a GPU-based approach can significantly speed up these modifications compared to a CPU.
Physics-accurate EUV lithography simulator — LPP Sn-plasma source, CXRO materials, multilayer TMM optics, RCWA 1D/2D mask3D, Abbe/Hopkins aerial imaging with partial coherence, resist chain (Dill ABC, PEB, development, shot noise), process window (Bossung, DoF/EL), resist calibration from wafer data. Apache-2.0, 534 tests, 6 verified notebooks.
JMP-based lithography line-width CD control, SPC, ANOVA, and process capability analysis using NIST wafer data.
Photolithographic mask visualization and automatic microelectrode array design
MOSFET front-end fabrication lab covering oxidation, photolithography, oxide etching, phosphorus diffusion, drive-in, gate oxide formation, and process measurement.
Precision control software for photolithography systems. Optimized for R-LithoPhos workflows.
Optimized photolithography process using JMP & Six Sigma to eliminate 9.3% scrap. Resolved low Dose & PEB_Temp issues by shifting parameters (Dose=35, PEB_Temp=130°C). Boosted process capability (Cpk) by +372% (0.44 to 2.075) and achieved 0.6608µm Critical Dimension (target 0.65).
基于LED阵列的365nm紫外光自动匀光系统 | 365nm UV LED Auto-Uniformity System for Photolithography
A plugin for KLayout that generates a machine-readable barcode for GCA optical steppers.
This repository contains the complete documentation of my research work done on photolithography process as a part of building a complete digital twin of semiconductor fabrication processes during my summer internship 2026 at Indian Institute Of Technology Gandhinagar (SRIP 2026)
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