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Improved selector behavior in ultrathin chromium-doped V$_2$O$_3$ films
Authors:
Johannes Mohr,
Tyler Hennen,
Yudi Wang,
Xiaoyu Xu,
Loc Vinh,
Dirk J. Wouters,
Rainer Waser,
Joyeeta Nag,
Daniel Bedau
Abstract:
Devices based on the negative differential resistance effect in chromium doped V$_2$O$_3$ are considered to be promising as selector elements for use in emerging memory technologies, as well as for neuromorphic applications. It is shown by electrical measurements, that the switching effect is maintained for very thin films down to 5 nm, and even improved properties such as a low leakage current an…
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Devices based on the negative differential resistance effect in chromium doped V$_2$O$_3$ are considered to be promising as selector elements for use in emerging memory technologies, as well as for neuromorphic applications. It is shown by electrical measurements, that the switching effect is maintained for very thin films down to 5 nm, and even improved properties such as a low leakage current and an abrupt transition are observed. For these thicknesses, the behavior of crystalline and amorphous films becomes very similar; most strikingly, a forming step is required in both. Transmission electron microscopy reveals this to be likely due to a thin amorphous layer that forms at the interface to the TiN electrode. Elemental mapping further shows a complex distribution of the chromium dopants, as well as a diffusion of Ti into the layer from the electrode, which might be responsible for the improved properties.
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Submitted 9 June, 2026;
originally announced June 2026.
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Electronic vs. phononic thermal transport in Cr-doped V2O3 thin films across the Mott transition
Authors:
Johannes Mohr,
Kiumars Aryana,
Md. Rafiqul Islam,
Dirk J. Wouters,
Rainer Waser,
Patrick E. Hopkins,
Joyeeta Nag,
Daniel Bedau
Abstract:
Understanding the thermal conductivity of chromium doped V2O3 is crucial for optimizing the design of selectors for memory and neuromorphic devices. We utilized the time-domain thermoreflectance technique to measure the thermal conductivity of chromium doped V2O3 across varying concentrations, spanning the doping induced metal-insulator transition. In addition, different oxygen stoichiometries and…
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Understanding the thermal conductivity of chromium doped V2O3 is crucial for optimizing the design of selectors for memory and neuromorphic devices. We utilized the time-domain thermoreflectance technique to measure the thermal conductivity of chromium doped V2O3 across varying concentrations, spanning the doping induced metal-insulator transition. In addition, different oxygen stoichiometries and film thicknesses were investigated in their crystalline and amorphous phases. Chromium doping concentration (0%-30%) and the degree of crystallinity emerged as the predominant factors influencing the thermal properties, while the effect of oxygen flow (600-1400 ppm) during deposition proved to be negligible. Our observations indicate that even in the metallic phase of V2O3, the lattice contribution is the dominant factor in thermal transport with no observable impact from the electrons on heat transport. Finally, the thermal conductivity of both amorphous and crystalline V2O3 was measured at cryogenic temperatures (80-450 K). Our thermal conductivity measurements as a function of temperature reveal that both phases exhibit behavior similar to amorphous materials, indicating pronounced phonon scattering effects in the crystalline phase of V2O3.
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Submitted 16 September, 2024;
originally announced September 2024.
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Bulk-like Mott-Transition in ultrathin Cr-doped V2O3 films and the influence of its variability on scaled devices
Authors:
Johannes Mohr,
Tyler Hennen,
Daniel Bedau,
Rainer Waser,
Dirk J. Wouters
Abstract:
The pressure driven Mott-transition in Chromium doped V2O3 films is investigated by direct electrical measurements on polycrystalline films with thicknesses down to 10 nm, and doping concentrations of 2%, 5% and 15%. A change in resistivity of nearly two orders of magnitude is found for 2% doping. A simulation model based on a scaling law description of the phase transition and percolative behavio…
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The pressure driven Mott-transition in Chromium doped V2O3 films is investigated by direct electrical measurements on polycrystalline films with thicknesses down to 10 nm, and doping concentrations of 2%, 5% and 15%. A change in resistivity of nearly two orders of magnitude is found for 2% doping. A simulation model based on a scaling law description of the phase transition and percolative behavior in a resistor lattice is developed. This is used to show that despite significant deviations in the film structure from single crystals, the transition behavior is very similar. Finally, the influence of the variability between grains on the characteristics of scaled devices is investigated and found to allow for scaling down to at least 50 nm device width.
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Submitted 13 May, 2024;
originally announced May 2024.
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Synaptogen: A cross-domain generative device model for large-scale neuromorphic circuit design
Authors:
Tyler Hennen,
Leon Brackmann,
Tobias Ziegler,
Sebastian Siegel,
Stephan Menzel,
Rainer Waser,
Dirk J. Wouters,
Daniel Bedau
Abstract:
We present a fast generative modeling approach for resistive memories that reproduces the complex statistical properties of real-world devices. To enable efficient modeling of analog circuits, the model is implemented in Verilog-A. By training on extensive measurement data of integrated 1T1R arrays (6,000 cycles of 512 devices), an autoregressive stochastic process accurately accounts for the cros…
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We present a fast generative modeling approach for resistive memories that reproduces the complex statistical properties of real-world devices. To enable efficient modeling of analog circuits, the model is implemented in Verilog-A. By training on extensive measurement data of integrated 1T1R arrays (6,000 cycles of 512 devices), an autoregressive stochastic process accurately accounts for the cross-correlations between the switching parameters, while non-linear transformations ensure agreement with both cycle-to-cycle (C2C) and device-to-device (D2D) variability. Benchmarks show that this statistically comprehensive model achieves read/write throughputs exceeding those of even highly simplified and deterministic compact models.
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Submitted 9 April, 2024;
originally announced April 2024.
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Fabrication of highly resistive NiO thin films for nanoelectronic applications
Authors:
Johannes Mohr,
Tyler Hennen,
Daniel Bedau,
Joyeeta Nag,
Rainer Waser,
Dirk J. Wouters
Abstract:
Thin films of the prototypical charge transfer insulator NiO appear to be a promising material for novel nanoelectronic devices. The fabrication of the material is challenging however, and mostly a p-type semiconducting phase is reported. Here, the results of a factorial experiment are presented that allow optimization of the film properties of thin films deposited using sputtering. A cluster anal…
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Thin films of the prototypical charge transfer insulator NiO appear to be a promising material for novel nanoelectronic devices. The fabrication of the material is challenging however, and mostly a p-type semiconducting phase is reported. Here, the results of a factorial experiment are presented that allow optimization of the film properties of thin films deposited using sputtering. A cluster analysis is performed, and four main types of films are found. Among them, the desired insulating phase is identified. From this material, nanoscale devices are fabricated, which demonstrate that the results carry over to relevant length scales. Initial switching results are reported.
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Submitted 21 July, 2022;
originally announced July 2022.
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A High Throughput Generative Vector Autoregression Model for Stochastic Synapses
Authors:
T. Hennen,
A. Elias,
J. F. Nodin,
G. Molas,
R. Waser,
D. J. Wouters,
D. Bedau
Abstract:
By imitating the synaptic connectivity and plasticity of the brain, emerging electronic nanodevices offer new opportunities as the building blocks of neuromorphic systems. One challenge for largescale simulations of computational architectures based on emerging devices is to accurately capture device response, hysteresis, noise, and the covariance structure in the temporal domain as well as betwee…
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By imitating the synaptic connectivity and plasticity of the brain, emerging electronic nanodevices offer new opportunities as the building blocks of neuromorphic systems. One challenge for largescale simulations of computational architectures based on emerging devices is to accurately capture device response, hysteresis, noise, and the covariance structure in the temporal domain as well as between the different device parameters. We address this challenge with a high throughput generative model for synaptic arrays that is based on a recently available type of electrical measurement data for resistive memory cells. We map this real world data onto a vector autoregressive stochastic process to accurately reproduce the device parameters and their cross-correlation structure. While closely matching the measured data, our model is still very fast; we provide parallelized implementations for both CPUs and GPUs and demonstrate array sizes above one billion cells and throughputs exceeding one hundred million weight updates per second, above the pixel rate of a 30 frames/s 4K video stream.
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Submitted 10 May, 2022;
originally announced May 2022.
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Stabilizing amplifier with a programmable load line for characterization of nanodevices with negative differential resistance
Authors:
T. Hennen,
E. Wichmann,
R. Waser,
D. J. Wouters,
D. Bedau
Abstract:
Resistive switching devices and other components with negative differential resistance (NDR) are emerging as possible electronic constituents of next-generation computing architectures. Due to the NDR effects exhibited, switching operations are strongly affected by the presence of resistance in series with the memory cell. Experimental measurements useful in the development of these devices use a…
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Resistive switching devices and other components with negative differential resistance (NDR) are emerging as possible electronic constituents of next-generation computing architectures. Due to the NDR effects exhibited, switching operations are strongly affected by the presence of resistance in series with the memory cell. Experimental measurements useful in the development of these devices use a deliberate addition of series resistance, which can be done either by integrating resistors on-chip or by connecting external components to the wafer probing system. The former approach is considered inflexible because the resistance value attached to a given device cannot be changed or removed, while the latter approach tends to create parasitic effects that impact controllability and interfere with measurements. In this work we introduce a circuit design for flexible characterization of two-terminal nanodevices that provides a programmatically adjustable external series resistance while maintaining low parasitic capacitance. Experimental demonstrations are given that show the impact of the series resistance on NDR and resistive switching measurements.
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Submitted 30 November, 2021;
originally announced December 2021.
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Current-limiting amplifier for high speed measurement of resistive switching data
Authors:
T. Hennen,
E. Wichmann,
A. Elias,
J. Lille,
O. Mosendz,
R. Waser,
D. J. Wouters,
D. Bedau
Abstract:
Resistive switching devices, important for emerging memory and neuromorphic applications, face significant challenges related to control of delicate filamentary states in the oxide material. As a device switches, its rapid conductivity change is involved in a positive feedback process that would lead to runaway destruction of the cell without current, voltage, or energy limitation. Typically, cell…
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Resistive switching devices, important for emerging memory and neuromorphic applications, face significant challenges related to control of delicate filamentary states in the oxide material. As a device switches, its rapid conductivity change is involved in a positive feedback process that would lead to runaway destruction of the cell without current, voltage, or energy limitation. Typically, cells are directly patterned on MOS transistors to limit the current, but this approach is very restrictive as the necessary integration limits the materials available as well as the fabrication cycle time. In this article we propose an external circuit to cycle resistive memory cells, capturing the full transfer curves while driving the cells in such a way to suppress runaway transitions. Using this circuit, we demonstrate the acquisition of $10^5$ I-V loops per second without the use of on-wafer current limiting transistors. This setup brings voltage sweeping measurements to a relevant timescale for applications, and enables many new experimental possibilities for device evaluation in a statistical context.
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Submitted 10 February, 2021;
originally announced February 2021.
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Design of materials properties and device performance in memristive systems
Authors:
Michael Lübben,
Felix Cüppers,
Johannes Mohr,
Moritz von Witzleben,
Uwe Breuer,
Rainer Waser,
Christian Neumann,
Ilia Valov
Abstract:
Future development of the modern nanoelectronics and its flagships internet of things and artificial intelligence as well as many related applications is largely associated with memristive elements. This technology offers a broad spectrum of functionalities, however, it follows predominantly a phenomenological approach and crucial challenge/limit for further development remains variability and lac…
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Future development of the modern nanoelectronics and its flagships internet of things and artificial intelligence as well as many related applications is largely associated with memristive elements. This technology offers a broad spectrum of functionalities, however, it follows predominantly a phenomenological approach and crucial challenge/limit for further development remains variability and lack of fundamental materials' design strategy. Here we demonstrate the vital importance of materials' purity for determining memristors' functionalities, showing that part per million foreign elements significantly change the performance. By appropriate choice of chemistry and amount of doping material we can selectively enhance desired operation mode. We highlight how dopant dependent structure and charge/potential distribution in the space charge layers and the cell capacitance determine the device kinetics and functions. We evidence for first time experimentally the relation between materials properties and switching/neuromorphic performance, thus providing rules and directions for a rational design of memristive devices.
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Submitted 5 February, 2019;
originally announced February 2019.
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Self-Assembling Oxide Catalyst for Electrochemical Water Splitting
Authors:
Daniel S. Bick,
Andreas Kindsmueller,
Deok-Yong Cho,
Ahmed Yousef Mohamed,
Thomas Bredow,
Hendrik Laufen,
Felix Gunkel,
David N. Mueller,
Theodor Schneller,
Rainer Waser,
Ilia Valov
Abstract:
Renewable energy conversion and storage, and greenhouse gas emission-free technologies are within the primary tasks and challenges for the society. Hydrogen fuel, produced by alkaline water electrolysis is fulfilling all these demands, however the technology is economically feeble, limited by the slow rate of oxygen evolution reaction. Complex metal oxides were suggested to overcome this problem b…
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Renewable energy conversion and storage, and greenhouse gas emission-free technologies are within the primary tasks and challenges for the society. Hydrogen fuel, produced by alkaline water electrolysis is fulfilling all these demands, however the technology is economically feeble, limited by the slow rate of oxygen evolution reaction. Complex metal oxides were suggested to overcome this problem being low-cost efficient catalysts. However, the insufficient long-term stability, degradation of structure and electrocatalytic activity are restricting their utilization. Here we report on a new perovskite-based self-assembling material BaCo0.98Ti0.02O3-$δ$:Co3O4 with superior performance, showing outstanding properties compared to current state-of-the-art materials without degeneration of its properties even at 353 K. By chemical and structural analysis the degradation mechanism was identified and modified by selective doping. Short-range order and chemical composition rather than long-range order are factors determining the outstanding performance. The derived general design rules can be used for further development of oxide-based electrocatalytic materials.
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Submitted 11 July, 2017;
originally announced July 2017.
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Hafnium carbide formation in oxygen deficient hafnium oxide thin films
Authors:
C. Rodenbücher,
E. Hildebrandt,
K. Szot,
S. U. Sharath,
J. Kurian,
P. Komissinskiy,
U. Breuer,
R. Waser,
L. Alff
Abstract:
On highly oxygen deficient thin films of hafnium oxide (hafnia, HfO$_{2-x}$) contaminated with adsorbates of carbon oxides, the formation of hafnium carbide (HfC$_x$) at the surface during vacuum annealing at temperatures as low as 600 °C is reported. Using X-ray photoelectron spectroscopy the evolution of the HfC$_x$ surface layer related to a transformation from insulating into metallic state is…
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On highly oxygen deficient thin films of hafnium oxide (hafnia, HfO$_{2-x}$) contaminated with adsorbates of carbon oxides, the formation of hafnium carbide (HfC$_x$) at the surface during vacuum annealing at temperatures as low as 600 °C is reported. Using X-ray photoelectron spectroscopy the evolution of the HfC$_x$ surface layer related to a transformation from insulating into metallic state is monitored in situ. In contrast, for fully stoichiometric HfO$_2$ thin films prepared and measured under identical conditions, the formation of HfC$_x$ was not detectable suggesting that the enhanced adsorption of carbon oxides on oxygen deficient films provides a carbon source for the carbide formation. This shows that a high concentration of oxygen vacancies in carbon contaminated hafnia lowers considerably the formation energy of hafnium carbide. Thus, the presence of a sufficient amount of residual carbon in resistive random access memory devices might lead to a similar carbide formation within the conducting filaments due to Joule heating.
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Submitted 27 June, 2016;
originally announced June 2016.
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Inhomogeneity of donor doping in SrTiO3 substrates studied by fluorescence-lifetime imaging microscopy
Authors:
C. Rodenbücher,
T. Gensch,
W. Speier,
U. Breuer,
M. Pilch,
H. Hardtdegen,
M. Mikulics,
E. Zych,
R. Waser,
K. Szot
Abstract:
Fluorescence-lifetime imaging microscopy (FLIM) was applied to investigate the donor distribution in SrTiO3 single crystals. On the surfaces of Nb- and La-doped SrTiO3, structures with different fluorescence intensities and lifetimes were found that could be related to different concentrations of Ti3+. Furthermore, the inhomogeneous distribution of donors caused a non-uniform conductivity of the s…
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Fluorescence-lifetime imaging microscopy (FLIM) was applied to investigate the donor distribution in SrTiO3 single crystals. On the surfaces of Nb- and La-doped SrTiO3, structures with different fluorescence intensities and lifetimes were found that could be related to different concentrations of Ti3+. Furthermore, the inhomogeneous distribution of donors caused a non-uniform conductivity of the surface, which complicates the production of potential electronic devices by the deposition of oxide thin films on top of doped single crystals. Hence, we propose FLIM as a convenient technique (length scale: 1 $μ$m) for characterizing the quality of doped oxide surfaces, which could help to identify appropriate substrate materials.
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Submitted 22 October, 2013;
originally announced October 2013.
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Insulator-to-metal transition of SrTiO3:Nb single crystal surfaces induced by Ar+ bombardment
Authors:
C. Rodenbücher,
S. Wicklein,
R. Waser,
K. Szot
Abstract:
In this paper, the effect of Ar+ bombardment of SrTiO3:Nb surface layers is investigated on the macro- and nanoscale using surface-sensitive methods. After bombardment, the stoichiometry and electronic structure are changed distinctly leading to an insulator-to-metal transition related to the change of the Ti "d" electron from d0 to d1 and d2. During bombardment, conducting islands are formed on t…
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In this paper, the effect of Ar+ bombardment of SrTiO3:Nb surface layers is investigated on the macro- and nanoscale using surface-sensitive methods. After bombardment, the stoichiometry and electronic structure are changed distinctly leading to an insulator-to-metal transition related to the change of the Ti "d" electron from d0 to d1 and d2. During bombardment, conducting islands are formed on the surface. The induced metallic state is not stable and can be reversed due to a redox process by external oxidation and even by self-reoxidation upon heating the sample to temperatures of 300°C.
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Submitted 15 March, 2013;
originally announced March 2013.
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Nanobatteries in redox-based resistive switches require extension of memristor theory
Authors:
Ilia Valov,
Eike Linn,
Stefan Tappertzhofen,
Sebastian Schmelzer,
Jan van den Hurk,
Florian Lentz,
Rainer Waser
Abstract:
Redox-based nanoionic resistive memory cells (ReRAMs) are one of the most promising emerging nano-devices for future information technology with applications for memory, logic and neuromorphic computing. Recently, the serendipitous discovery of the link between ReRAMs and memristors and memristive devices has further intensified the research in this field. Here we show on both a theoretical and an…
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Redox-based nanoionic resistive memory cells (ReRAMs) are one of the most promising emerging nano-devices for future information technology with applications for memory, logic and neuromorphic computing. Recently, the serendipitous discovery of the link between ReRAMs and memristors and memristive devices has further intensified the research in this field. Here we show on both a theoretical and an experimental level that nanoionic-type memristive elements are inherently controlled by non-equilibrium states resulting in a nanobattery. As a result the memristor theory must be extended to fit the observed non zerocrossing I-V characteristics. The initial electromotive force of the nanobattery depends on the chemistry and the transport properties of the materials system but can also be introduced during ReRAM cell operations. The emf has a strong impact on the dynamic behaviour of nanoscale memories, and thus, its control is one of the key factors for future device development and accurate modelling.
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Submitted 11 March, 2013;
originally announced March 2013.
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Polarization dependent interface properties of ferroelectric Schottky barriers studied by soft X-ray absorption spectroscopy
Authors:
H. Kohlstedt,
A. Petraru,
M. Meier J. Denlinger,
J. Guo,
Y. Wanli,
A. Scholl,
B. Freelon,
T. Schneller,
R. Waser,
P. Yu,
R. Ramesh,
T. Learmonth,
P. -A. Glans,
K. E. Smith
Abstract:
We applied soft X-ray absorption spectroscopy to study the Ti L-edge in ferroelectric capacitors using a modified total electron yield method. The inner photo currents and the X-ray absorption spectra were polarization state dependent. The results are explained on the basis of photo electric effects and the inner potential in the ferroelectric capacitors as a result of back-to-back Schottky barr…
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We applied soft X-ray absorption spectroscopy to study the Ti L-edge in ferroelectric capacitors using a modified total electron yield method. The inner photo currents and the X-ray absorption spectra were polarization state dependent. The results are explained on the basis of photo electric effects and the inner potential in the ferroelectric capacitors as a result of back-to-back Schottky barriers superimposed by the potential due to the depolarization field. In general, the presented method offers the opportunity to investigate the electronic structure of buried metal-insulator and metal-semiconductor interfaces in thin film devices. Corresponding author: h.h.kohlstedt@fz-juelich.de
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Submitted 23 October, 2008;
originally announced October 2008.
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Ferromagnetic 0-pi Josephson junctions
Authors:
M. Weides,
H. Kohlstedt,
R. Waser,
M. Kemmler,
J. Pfeiffer,
D. Koelle,
R. Kleiner,
E. Goldobin
Abstract:
We present a study on low-$T_c$ superconductor-insulator-ferromagnet-superconductor (SIFS) Josephson junctions. SIFS junctions have gained considerable interest in recent years because they show a number of interesting properties for future classical and quantum computing devices. We optimized the fabrication process of these junctions to achieve a homogeneous current transport, ending up with h…
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We present a study on low-$T_c$ superconductor-insulator-ferromagnet-superconductor (SIFS) Josephson junctions. SIFS junctions have gained considerable interest in recent years because they show a number of interesting properties for future classical and quantum computing devices. We optimized the fabrication process of these junctions to achieve a homogeneous current transport, ending up with high-quality samples. Depending on the thickness of the ferromagnetic layer and on temperature, the SIFS junctions are in the ground state with a phase drop either 0 or $π$. By using a ferromagnetic layer with variable step-like thickness along the junction, we obtained a so-called 0-$π$ Josephson junction, in which 0 and $π$ ground states compete with each other. At a certain temperature the 0 and $π$ parts of the junction are perfectly symmetric, i.e. the absolute critical current densities are equal. In this case the degenerate ground state corresponds to a vortex of supercurrent circulating clock- or counterclockwise and creating a magnetic flux which carries a fraction of the magnetic flux quantum $Φ_0$.
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Submitted 27 April, 2007; v1 submitted 29 January, 2007;
originally announced January 2007.
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0-pi Josephson tunnel junctions with ferromagnetic barrier
Authors:
M. Weides,
M. Kemmler,
E. Goldobin,
H. Kohlstedt,
R. Waser,
D. Koelle,
R. Kleiner
Abstract:
We fabricated high quality Nb/Al_2O_3/Ni_{0.6}Cu_{0.4}/Nb superconductor-insulator-ferromagnet-superconductor Josephson tunnel junctions. Using a ferromagnetic layer with a step-like thickness, we obtain a 0-pi junction, with equal lengths and critical currents of 0 and pi parts. The ground state of our 330 microns (1.3 lambda_J) long junction corresponds to a spontaneous vortex of supercurrent…
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We fabricated high quality Nb/Al_2O_3/Ni_{0.6}Cu_{0.4}/Nb superconductor-insulator-ferromagnet-superconductor Josephson tunnel junctions. Using a ferromagnetic layer with a step-like thickness, we obtain a 0-pi junction, with equal lengths and critical currents of 0 and pi parts. The ground state of our 330 microns (1.3 lambda_J) long junction corresponds to a spontaneous vortex of supercurrent pinned at the 0-pi step and carrying ~6.7% of the magnetic flux quantum Phi_0. The dependence of the critical current on the applied magnetic field shows a clear minimum in the vicinity of zero field.
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Submitted 5 October, 2006; v1 submitted 26 May, 2006;
originally announced May 2006.
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Theoretical current-voltage characteristics of ferroelectric tunnel junctions
Authors:
H. Kohlstedt,
N. A. Pertsev,
J. Rodriguez Contreras,
R. Waser
Abstract:
We present the concept of ferroelectric tunnel junctions (FTJs). These junctions consist of two metal electrodes separated by a nanometer-thick ferroelectric barrier. The current-voltage characteristics of FTJs are analyzed under the assumption that the direct electron tunneling represents the dominant conduction mechanism. First, the influence of converse piezoelectric effect inherent in ferroe…
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We present the concept of ferroelectric tunnel junctions (FTJs). These junctions consist of two metal electrodes separated by a nanometer-thick ferroelectric barrier. The current-voltage characteristics of FTJs are analyzed under the assumption that the direct electron tunneling represents the dominant conduction mechanism. First, the influence of converse piezoelectric effect inherent in ferroelectric materials on the tunnel current is described. The calculations show that the lattice strains of piezoelectric origin modify the current-voltage relationship owing to strain-induced changes of the barrier thickness, electron effective mass, and position of the conduction-band edge. Remarkably, the conductance minimum becomes shifted from zero voltage due to the piezoelectric effect, and a strain-related resistive switching takes place after the polarization reversal in a ferroelectric barrier. Second, we analyze the influence of the internal electric field arising due to imperfect screening of polarization charges by electrons in metal electrodes. It is shown that, for asymmetric FTJs, this depolarizing-field effect also leads to a considerable change of the barrier resistance after the polarization reversal. However, the symmetry of the resulting current-voltage loop is different from that characteristic of the strain-related resistive switching. The crossover from one to another type of the hysteretic curve, which accompanies the increase of FTJ asymmetry, is described taking into account both the strain and depolarizing-field effects. It is noted that asymmetric FTJs with dissimilar top and bottom electrodes are preferable for the non-volatile memory applications because of a larger resistance on/off ratio.
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Submitted 22 March, 2005;
originally announced March 2005.
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Polarization states of polydomain epitaxial Pb(Zr1-xTix)O3 thin films and their dielectric properties
Authors:
V. G. Kukhar,
N. A. Pertsev,
H. Kohlstedt,
R. Waser
Abstract:
Ferroelectric and dielectric properties of polydomain (twinned) single-crystal Pb(Zr1-xTix)O3 thin films are described with the aid of a nonlinear thermodynamic theory, which has been developed recently for epitaxial ferroelectric films with dense laminar domain structures. For Pb(Zr1-xTix)O3 (PZT) films with compositions x = 0.9, 0.8, 0.7, 0.6, 0.5, and 0.4, the "misfit strain-temperature" phas…
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Ferroelectric and dielectric properties of polydomain (twinned) single-crystal Pb(Zr1-xTix)O3 thin films are described with the aid of a nonlinear thermodynamic theory, which has been developed recently for epitaxial ferroelectric films with dense laminar domain structures. For Pb(Zr1-xTix)O3 (PZT) films with compositions x = 0.9, 0.8, 0.7, 0.6, 0.5, and 0.4, the "misfit strain-temperature" phase diagrams are calculated and compared with each other. It is found that the equilibrium diagrams of PZT films with x > 0.7 are similar to the diagram of PbTiO3 films. They consist of only four different stability ranges, which correspond to the paraelectric phase, single-domain tetragonal ferroelectric phase, and two pseudo-tetragonal domain patterns. In contrast, at x = 0.4, 0.5, and 0.6, the equilibrium diagram displays a rich variety of stable polarization states, involving at least one monoclinic polydomain state. Using the developed phase diagrams, the mean out-of-plane polarization of a poled PZT film is calculated as a function of the misfit strain and composition. Theoretical results are compared with the measured remanent polarizations of PZT films grown on SrTiO3. Dependence of the out-of-plane dielectric response of PZT films on the misfit strain in the heterostructure is also reported.
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Submitted 25 November, 2004;
originally announced November 2004.
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Ultrathin epitaxial ferroelectric films grown on compressive substrates: Competition between the surface and strain effects
Authors:
A. G. Zembilgotov,
N. A. Pertsev,
H. Kohlstedt,
R. Waser
Abstract:
The mean-field Landau-type theory is used to analyze the polarization properties of epitaxial ferroelectric thin films grown on dissimilar cubic substrates, which induce biaxial compressive stress in the film plane. The intrinsic effect of the film surfaces on the spontaneous polarization is taken into account via the concept of the extrapolation length. The theory simultaneously allows for the…
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The mean-field Landau-type theory is used to analyze the polarization properties of epitaxial ferroelectric thin films grown on dissimilar cubic substrates, which induce biaxial compressive stress in the film plane. The intrinsic effect of the film surfaces on the spontaneous polarization is taken into account via the concept of the extrapolation length. The theory simultaneously allows for the influence of the misfit strain imposed on the film lattice by a thick substrate. Numerical calculations are performed for PbTiO3 and BaTiO3 films under an assumption of the polarization reduction in surface layers. The film mean polarization is calculated as a function of film thickness, temperature, and misfit strain. It is shown that the negative intrinsic size effect is reduced in epitaxial films due to the in-plane compression of the film lattice. At room temperature, strong reduction of the mean polarization may take place only in ultrathin films (thickness ~ 1 nm). Theoretical predictions are compared with the available experimental data on polarization properties of BaTiO3 films grown on SrRuO3 coated SrTiO3.
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Submitted 12 November, 2001;
originally announced November 2001.
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Thermodynamic theory of epitaxial ferroelectric thin films with dense domain structures
Authors:
V. G. Koukhar,
N. A. Pertsev,
R. Waser
Abstract:
A Landau-Ginsburg-Devonshire-type nonlinear phenomenological theory is presented, which enables the thermodynamic description of dense laminar polydomain states in epitaxial ferroelectric thin films. The theory explicitly takes into account the mechanical substrate effect on the polarizations and lattice strains in dissimilar elastic domains (twins). Numerical calculations are performed for PbTi…
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A Landau-Ginsburg-Devonshire-type nonlinear phenomenological theory is presented, which enables the thermodynamic description of dense laminar polydomain states in epitaxial ferroelectric thin films. The theory explicitly takes into account the mechanical substrate effect on the polarizations and lattice strains in dissimilar elastic domains (twins). Numerical calculations are performed for PbTiO3 and BaTiO3 films grown on (001)-oriented cubic substrates. The "misfit strain-temperature" phase diagrams are developed for these films, showing stability ranges of various possible polydomain and single-domain states. Three types of polarization instabilities are revealed for polydomain epitaxial ferroelectric films, which may lead to the formation of new polydomain states forbidden in bulk crystals. The total dielectric and piezoelectric small-signal responses of polydomain films are calculated, resulting from both the volume and domain-wall contributions. For BaTiO3 films, strong dielectric anomalies are predicted at room temperature near special values of the misfit strain.
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Submitted 26 February, 2001;
originally announced February 2001.