Showing 1–17 of 17 results for author: Ajay, A

MBE-grown virtual substrates for quantum dots emitting in the telecom O- and C-bands

Authors: Bianca Scaparra, Elise Sirotti, Akhil Ajay, Bjoern Jonas, Beatrice Costa, Hubert Riedl, Pavel Avdienko, Ian D. Sharp, Gregor Koblmueller, Eugenio Zallo, Jonathan J. Finley, Kai Mueller

Abstract: InAs semiconductor quantum dots (QDs) emitting in the near infrared are promising platforms for on-demand single-photon sources and spin-photon interfaces. However, the realization of quantum-photonic nanodevices emitting in the second and third telecom windows with similar performance remains an open challenge. Here, we report an optimized heterostructure design for QDs emitting in the O- and C-b… ▽ More InAs semiconductor quantum dots (QDs) emitting in the near infrared are promising platforms for on-demand single-photon sources and spin-photon interfaces. However, the realization of quantum-photonic nanodevices emitting in the second and third telecom windows with similar performance remains an open challenge. Here, we report an optimized heterostructure design for QDs emitting in the O- and C-bands grown by means of molecular beam epitaxy. The InAs QDs are grown on compositionally graded InGaAs buffers, which act as virtual substrates, and are embedded in mostly relaxed active regions. Reciprocal space maps of the indium profiles and optical absorption spectra are used to optimize In0.22Ga0.78As and In0.30Ga0.70As active regions, accounting for the chosen indium grading profile. This approach results in a tunable QD photoluminescence (PL) emission from 1200 up to 1600 nm. Power and polarization dependent micro-PL measurements performed at 4 K reveal exciton-biexciton complexes from quantum dots emitting in the telecom O- and C-bands. The presented study establishes a flexible platform that can be an essential component for advanced photonic devices based on InAs/GaAs that serve as building blocks for future quantum networks. △ Less

Submitted 19 August, 2024; v1 submitted 17 July, 2024; originally announced July 2024.

Ultraviolet Photodetectors based on GaN and AlGaN/AlN Nanowire Ensembles: Effects of Planarization with Hydrogen Silsesquioxane and Nanowire Architecture

Authors: E. Akar, I. Dimkou, A. Ajay, Martien I. den Hertog, E. Monroy

Abstract: The interest in nanowire photodetectors stems from their potential to improve the performance of a variety of devices, including solar cells, cameras, sensors, and communication systems. Implementing devices based on nanowire ensembles requires a planarization process which must be conceived to preserve the advantages of the nanowire geometry. This is particularly challenging in the ultraviolet (U… ▽ More The interest in nanowire photodetectors stems from their potential to improve the performance of a variety of devices, including solar cells, cameras, sensors, and communication systems. Implementing devices based on nanowire ensembles requires a planarization process which must be conceived to preserve the advantages of the nanowire geometry. This is particularly challenging in the ultraviolet (UV) range, where spin coating with hydrogen silsesquioxane (HSQ) appears as an interesting approach in terms of transmittance and refractive index. Here, we report a comprehensive study on UV photodetectors based on GaN or AlGaN/AlN nanowire ensembles encapsulated in HSQ. We show that this material is efficient for passivating the nanowire surface, it introduces a compressive strain in the nanowires and preserves their radiative efficiency. We discuss the final performance of planarized UV photodetectors based on three kinds of nanowire ensembles: (i) non-intentionally-doped (nid) GaN nanowires, (ii) Ge-doped GaN nanowires, and (iii) nid GaN nanowires terminated with an AlGaN/AlN superlattice. The incorporation of the superlattice allows tuning the spectral response with bias, which can enhance the carrier collection from the AlGaN/AlN superlattice or from the GaN stem. In all the cases, the performance of the planarized devices remains determined by the nanowire nature, since their characteristics in terms of linearity and spectral selectivity are closer to those demonstrated in single nanowires than those of planar devices. Thus, the visible rejection is several orders of magnitude and there is no indication of persistent photocurrent, which makes all the samples suitable for UV-selective photodetection applications. △ Less

Submitted 8 June, 2023; originally announced June 2023.

Journal ref: ACS Appl. Nano Mater. 2023

Comparison of the material quality of AlxIn1-xN (x ~ 0-0.50) films deposited on Si (100) and (111) by reactive RF sputtering

Authors: M. Sun, R. Blasco, M. de la Mata, S. I. Molina, A. Ajay, E. Monroy, S. Valdueza-Felip, F. B. Naranjo

Abstract: Here, we compare the material quality of AlxIn1-xN layers deposited on Si with different crystallographic orientations, (100) and (111), via radio-frequency (RF) sputtering. To modulate their Al content, the Al RF power was varied from 0 to 225 W, whereas the In RF power and deposition temperature were fixed at 30 W and 300oC, respectively. X-ray diffraction measurements reveal a c-axis-oriented w… ▽ More Here, we compare the material quality of AlxIn1-xN layers deposited on Si with different crystallographic orientations, (100) and (111), via radio-frequency (RF) sputtering. To modulate their Al content, the Al RF power was varied from 0 to 225 W, whereas the In RF power and deposition temperature were fixed at 30 W and 300oC, respectively. X-ray diffraction measurements reveal a c-axis-oriented wurtzite structure with no phase separation regardless of the Al content (x = 0-0.50), which increases with the Al power supply. The surface morphology of the AlxIn1-xN layers improves with increasing Al content and it is similar for samples grown on both Si substrates (the root-mean-square roughness decreases from 12 nm to 2.5 nm). Furthermore, from TEM images we notice a similar grain-like columnar morphology and defect density on samples deposited on both Si substrates under the same conditions. Simultaneously grown AlxIn1-xN-on-sapphire samples point to a residual n-type carrier concentration in the 1020-1021 cm-3 range. The optical band gap energy of these layers evolves from 1.75 eV to 2.56 eV with increasing Al content, consistent with the blue shift of their low-temperature photoluminescence. In general, the material quality of the AlxIn1-xN films on Si is similar for both crystallographic orientations. Nonetheless, samples deposited on sapphire show an improved structural and morphological characteristic likely due to the lower difference in lattice constants between the nitride and the sapphire substrate. △ Less

Submitted 23 December, 2021; originally announced December 2021.

Solubility limit of Ge Dopants in AlGaN: a Chemical and Microstructural Investigation down to the Nanoscale

Authors: C. Bougerol, E. Robin, E. Di Russo, E. Bellet-Amalric, V. Grenier, A. Ajay, L. Rigutti, E. Monroy

Abstract: Attaining low resistivity AlGaN layers is the keystone to improve the efficiency of light emitting devices in the ultraviolet spectral range. Here, we present a microstructural analysis of Ge-doped AlGaN samples with Al mole fraction from x=0 to 1, and nominal doping level in the range of 1E20 cm-3, together with the measurement of Ge concentration and its spatial distribution down to the nm scale… ▽ More Attaining low resistivity AlGaN layers is the keystone to improve the efficiency of light emitting devices in the ultraviolet spectral range. Here, we present a microstructural analysis of Ge-doped AlGaN samples with Al mole fraction from x=0 to 1, and nominal doping level in the range of 1E20 cm-3, together with the measurement of Ge concentration and its spatial distribution down to the nm scale. AlGaN:Ge samples with x smaller or equal to 0.2 do not present any sign of inhomogeneity. However, samples with x > 0.4 display micrometer-size Ge crystallites at the surface. Ge segregation is not restricted to the surface: Ge-rich regions with a size of tens of nanometers are observed inside the AlGaN:Ge layers, generally associated with Ga-rich regions around structural defects. With this local exceptions, the AlGaN:Ge matrix present an homogenous Ge composition which can be significantly lower than the nominal doping level. Precise measurements of Ge in the matrix provide a view of the solubility diagram of Ge in AlGaN as a function of the Al mole fraction. The solubility of Ge in AlN is extremely low. Between AlN and GaN, the solubility increases linearly with the Ga mole fraction in the ternary alloy, which suggests that the Ge incorporation takes place by substitution of Ga atoms only. The maximum percentage of Ga sites occupied by Ge saturates around 1%. The solubility issues and Ge segregation phenomena at different length scales likely play a role in the efficiency of Ge as n-type AlGaN dopant, even at Al concentrations where Ge DX centers are not expected to manifest. Therefore, this information can have direct impact in the performance of Ge-doped AlGaN light emitting diodes, particularly in the spectral range for disinfection (around 260 nm), which requires heavily-doped alloys with high Al mole fraction. △ Less

Submitted 26 October, 2020; originally announced October 2020.

Journal ref: ACS Appl. Mater. Interfaces 2021, 13, 4165-4173

Correlated electro-optical and structural study of electrically tunable nanowire quantum dot emitters

Authors: Maria Spies, Akhil Ajay, Eva Monroy, Bruno Gayral, M. den Hertog

Abstract: Quantum dots inserted in semiconducting nanowires are a promising platform for the fabrication of single photon devices. However, it is difficult to fully comprehend the electro-optical behaviour of such quantum objects without correlated studies of the structural and optical properties on the same nanowire. In this work, we study the spectral tunability of the emission of a single quantum dot in… ▽ More Quantum dots inserted in semiconducting nanowires are a promising platform for the fabrication of single photon devices. However, it is difficult to fully comprehend the electro-optical behaviour of such quantum objects without correlated studies of the structural and optical properties on the same nanowire. In this work, we study the spectral tunability of the emission of a single quantum dot in a GaN nanowire by applying external bias. The nanowires are dispersed and contacted on electron beam transparent Si3N4 membranes, so that transmission electron microscopy observations, photocurrent and micro-photoluminescence measurements under bias can be performed on the same specimen. The emission from a single dot blue or red shifts when the external electric field compensates or enhances the internal electric field generated by the spontaneous and piezoelectric polarization. A detailed study of two nanowire specimens emitting at 327.5 nm and 307.5 nm shows spectral shifts at rates of 20 and 12 meV/V, respectively. Theoretical calculations facilitated by the modelling of the △ Less

Submitted 6 February, 2020; originally announced February 2020.

Assessment of AlGaN/AlN superlattices on GaN nanowires as active region of electron-pumped ultraviolet sources

Authors: I. Dimkou, A. Harikumar, F. Donatini, J. Lähnemann, M. I. den Hertog, C. Bougerol, E. Bellet-Amalric, N. Mollard, A. Ajay, G. Ledoux, S. T. Purcell, E. Monroy

Abstract: In this paper, we describe the design and characterization of 400-nm-long (88 periods) AlxGa1-xN/AlN (0 < x < 0.1) quantum dot superlattices deposited on self-assembled GaN nanowires for application in electron-pumped ultraviolet sources. The optical performance of GaN/AlN superlattices on nanowires is compared with the emission of planar GaN/AlN superlattices with the same periodicity and thickne… ▽ More In this paper, we describe the design and characterization of 400-nm-long (88 periods) AlxGa1-xN/AlN (0 < x < 0.1) quantum dot superlattices deposited on self-assembled GaN nanowires for application in electron-pumped ultraviolet sources. The optical performance of GaN/AlN superlattices on nanowires is compared with the emission of planar GaN/AlN superlattices with the same periodicity and thickness grown on bulk GaN substrates along the N-polar and metal-polar crystallographic axes. The nanowire samples are less sensitive to nonradiative recombination than planar layers, attaining internal quantum efficiencies (IQE) in excess of 60% at room temperature even under low injection conditions. The IQE remains stable for higher excitation power densities, up to 50 kW/cm2. We demonstrate that the nanowire superlattice is long enough to collect the electron-hole pairs generated by an electron beam with an acceleration voltage VA = 5 kV. At such VA, the light emitted from the nanowire ensemble does not show any sign of quenching under constant electron beam excitation (tested for an excitation power density around 8 kW/cm2 over the scale of minutes). Varying the dot/barrier thickness ratio and the Al content in the dots, the nanowire peak emission can be tuned in the range from 340 to 258 nm. Keywords: GaN, AlN, nanowire, ultraviolet △ Less

Submitted 29 November, 2019; originally announced November 2019.

Journal ref: Nanotechnology 31, 204001 (2020)

Effect of the nanowire diameter on the linearity of the response of GaN-based heterostructured nanowire photodetectors

Authors: Maria Spies, Jakub Polaczyński, Akhil Ajay, Dipankar Kalita, Jonas Lähnemann, Bruno Gayral, Martien I. den Hertog, Eva Monroy

Abstract: Nanowire photodetectors are investigated because of their compatibility with flexible electronics, or for the implementation of on-chip optical interconnects. Such devices are characterized by ultrahigh photocurrent gain, but their photoresponse scales sublinearly with the optical power. Here, we present a study of single-nanowire photodetectors displaying a linear response to ultraviolet illumina… ▽ More Nanowire photodetectors are investigated because of their compatibility with flexible electronics, or for the implementation of on-chip optical interconnects. Such devices are characterized by ultrahigh photocurrent gain, but their photoresponse scales sublinearly with the optical power. Here, we present a study of single-nanowire photodetectors displaying a linear response to ultraviolet illumination. Their structure consists of a GaN nanowire incorporating an AlN/GaN/AlN heterostructure, which generates an internal electric field. The activity of the heterostructure is confirmed by the rectifying behavior of the current-voltage characteristics in the dark, as well as by the asymmetry of the photoresponse in magnitude and linearity. Under reverse bias (negative bias on the GaN cap segment), the detectors behave linearly with the impinging optical power when the nanowire diameter is below a certain threshold ($\approx$ 80 nm), which corresponds to the total depletion of the nanowire stem due to the Fermi level pinning at the sidewalls. In the case of nanowires that are only partially depleted, their nonlinearity is explained by a nonlinear variation of the diameter of their central conducting channel under illumination. △ Less

Submitted 29 April, 2019; originally announced April 2019.

Comments: This is the accepted manuscript version of an article that appeared in Nanotechnology. The CC BY-NC-ND 3.0 license applies, see https://creativecommons.org/licences/by-nc-nd/3.0

Journal ref: Nanotechnology 29, 255204 (2018)

Effect of Ge-doping on the short-wave, mid- and far-infrared intersubband transitions in GaN/AlGaN heterostructures

Authors: Caroline B. Lim, Akhil Ajay, Jonas Lähnemann, Catherine Bougerol, Eva Monroy

Abstract: This paper assesses the effects of Ge-doping on the structural and optical (band-to-band and intersubband (ISB)) properties of GaN/AlGaN multi-quantum wells (QWs) designed to display ISB absorption in the short-wave, mid- and far-infrared ranges (SWIR, MIR, and FIR, respectively). The standard c-plane crystallographic orientation is considered for wells absorbing in the SWIR and MIR spectral regio… ▽ More This paper assesses the effects of Ge-doping on the structural and optical (band-to-band and intersubband (ISB)) properties of GaN/AlGaN multi-quantum wells (QWs) designed to display ISB absorption in the short-wave, mid- and far-infrared ranges (SWIR, MIR, and FIR, respectively). The standard c-plane crystallographic orientation is considered for wells absorbing in the SWIR and MIR spectral regions, whereas the FIR structures are grown along the nonpolar m-axis. In all cases, we compare the characteristics of Ge-doped and Si-doped samples with the same design and various doping levels. The use of Ge appears to improve the mosaicity of the highly lattice-mismatched GaN/AlN heterostructures. However, when reducing the lattice mismatch, the mosaicity is rather determined by the substrate and does not show any dependence on the dopant nature or concentration. From the optical point of view, by increasing the dopant density, we observe a blueshift of the photoluminescence in polar samples due to the screening of the internal electric field by free carriers. In the ISB absorption, on the other hand, there is a systematic improvement of the linewidth when using Ge as a dopant for high doping levels, whatever the spectral region under consideration (i.e. different QW size, barrier composition and crystallographic orientation). △ Less

Submitted 22 March, 2019; originally announced March 2019.

Comments: This is the accepted manuscript version of an article that appeared in Semiconductor Science and Technology. The CC BY-NC-ND 3.0 license applies, see https://creativecommons.org/licences/by-nc-nd/3.0

Journal ref: Semicond. Sci. Technol. 32, 125002 (2017)

Electrical and Optical Properties of Heavily Ge-Doped AlGaN

Authors: R. Blasco, A. Ajay, E. Robin, C. Bougerol, K. Lorentz, L. C. Alves, I. Mouton, L. Amichi, A. Grenier, E. Monroy

Abstract: We report the effect of germanium as n-type dopant on the electrical and optical properties of AlxGa1-xN layers grown by plasma assisted molecular-beam epitaxy. The Al content has been varied from x = 0 to 0.66, confirmed by Rutherford backscattering spectrometry, and the Ge concentration was increased up to [Ge] = 1E21 cm-3. Even at these high doping levels Ge does not induce any structural degra… ▽ More We report the effect of germanium as n-type dopant on the electrical and optical properties of AlxGa1-xN layers grown by plasma assisted molecular-beam epitaxy. The Al content has been varied from x = 0 to 0.66, confirmed by Rutherford backscattering spectrometry, and the Ge concentration was increased up to [Ge] = 1E21 cm-3. Even at these high doping levels Ge does not induce any structural degradation in AlxGa1-xN layers with x below 0.15. However, for higher Al compositions, clustering of Ge forming crystallites were observed. Hall effect measurements show a gradual decrease of the carrier concentration when increasing the Al mole fraction, which is already noticeable in samples with x = 0.24. Samples with x = 0.64-0.66 remain conductive, but the donor activation rate drops to around 0.1% (carrier concentration around 1E18 cm-3 for [Ge] = 1E21 cm-3). From the optical point of view, the low temperature photoluminescence is dominated by the band-to-band emission, which show only spectral shift and broadening associated to the Burstein-Moss effect. The evolution of the photoluminescence peak position with temperature shows that the free carriers due to Ge doping can efficiently screen the potential fluctuations induced by alloy disorder. △ Less

Submitted 13 December, 2018; v1 submitted 25 October, 2018; originally announced October 2018.

Journal ref: R Blasco et al 2019 J. Phys. D: Appl. Phys. 52 125101

Near- and mid-infrared intersubband absorption in top-down GaN/AlN nano- and micropillars

Authors: Jonas Lähnemann, David A. Browne, Akhil Ajay, Mathieu Jeannin, Angela Vasanelli, Jean-Luc Thomassin, Edith Bellet-Amalric, Eva Monroy

Abstract: We present a systematic study of top-down processed GaN/AlN heterostructures for intersubband optoelectronic applications. Samples containing quantum well superlattices that display either near- or mid-infrared intersubband absorption were etched into nano- and micropillar arrays in an inductively coupled plasma. We investigate the influence of this process on the structure and strain-state, on th… ▽ More We present a systematic study of top-down processed GaN/AlN heterostructures for intersubband optoelectronic applications. Samples containing quantum well superlattices that display either near- or mid-infrared intersubband absorption were etched into nano- and micropillar arrays in an inductively coupled plasma. We investigate the influence of this process on the structure and strain-state, on the interband emission and on the intersubband absorption. Notably, for pillar spacings significantly smaller ($\leq1/3$) than the intersubband wavelength, the magnitude of the intersubband absorption is not reduced even when 90\% of the material is etched away and a similar linewidth is obtained. The same holds for the interband emission. In contrast, for pillar spacings on the order of the intersubband absorption wavelength, the intersubband absorption is masked by refraction effects and photonic crystal modes. The presented results are a first step towards micro- and nanostructured group-III nitride devices relying on intersubband transitions. △ Less

Submitted 23 October, 2018; v1 submitted 23 May, 2018; originally announced May 2018.

Journal ref: Nanotechnology 30 (5), 054002 (2019)

Near-infrared intersubband photodetection in GaN/AlN nanowires

Authors: Jonas Lähnemann, Akhil Ajay, Martien I. den Hertog, Eva Monroy

Abstract: Intersubband optoelectronic devices rely on transitions between quantum-confined electron levels in semiconductor heterostructures, which enables infrared (IR) photodetection in the 1-30 $μ$m wavelength window with picosecond response times. Incorporating nanowires as active media could enable an independent control over the electrical cross-section of the device and the optical absorption cross-s… ▽ More Intersubband optoelectronic devices rely on transitions between quantum-confined electron levels in semiconductor heterostructures, which enables infrared (IR) photodetection in the 1-30 $μ$m wavelength window with picosecond response times. Incorporating nanowires as active media could enable an independent control over the electrical cross-section of the device and the optical absorption cross-section. Furthermore, the three-dimensional carrier confinement in nanowire heterostructures opens new possibilities to tune the carrier relaxation time. However, the generation of structural defects and the surface sensitivity of GaAs nanowires have so far hindered the fabrication of nanowire intersubband devices. Here, we report the first demonstration of intersubband photodetection in a nanowire, using GaN nanowires containing a GaN/AlN superlattice absorbing at 1.55 $μ$m. The combination of spectral photocurrent measurements with 8-band k$\cdot$p calculations of the electronic structure supports the interpretation of the result as intersubband photodetection in these extremely short-period superlattices. We observe a linear dependence of the photocurrent with the incident illumination power, which confirms the insensitivity of the intersubband process to surface states and highlights how architectures featuring large surface-to-volume ratios are suitable as intersubband photodetectors. Our analysis of the photocurrent characteristics points out routes for an improvement of the device performance. This first nanowire based intersubband photodetector represents a technological breakthrough that paves the way to a powerful device platform with potential for ultrafast, ultrasensitive photodetectors and highly-efficient quantum cascade emitters with improved thermal stability. △ Less

Submitted 17 January, 2019; v1 submitted 2 October, 2017; originally announced October 2017.

Comments: This document is the unedited Author's version of a Submitted Work that was subsequently accepted for publication in Nano Letters (2017), copyright (C) American Chemical Society after peer review. To access the final edited and published work see http://dx.doi.org/10.1021/acs.nanolett.7b03414 , the supporting information is available (free of charge) under the same link

Journal ref: Nano Lett., 2017, 17 (11), pp 6954-6960

Effect of doping on the intersubband absorption in Si- and Ge-doped GaN/AlN heterostructures

Authors: A. Ajay, C. B. Lim, D. A. Browne, J. Polaczynski, E. Bellet-Amalric, J. Bleuse, M. I. den Hertog, E. Monroy

Abstract: In this paper, we study band-to-band and intersubband characteristics of GaN/AlN heterostructures (planar and nanowires) structurally designed to absorb in the short-wavelength infrared region, particularly at 1.55 microns. We compare the effect of doping the GaN sections with Si and Ge, and we discuss the variation of free-carrier screening with the doping density and well/nanodisk size. We obser… ▽ More In this paper, we study band-to-band and intersubband characteristics of GaN/AlN heterostructures (planar and nanowires) structurally designed to absorb in the short-wavelength infrared region, particularly at 1.55 microns. We compare the effect of doping the GaN sections with Si and Ge, and we discuss the variation of free-carrier screening with the doping density and well/nanodisk size. We observe that nanowire heterostructures consistently present longer photoluminescence decay times than their planar counterparts, which supports the existence of an in-plane piezoelectric field associated to the shear component of the strain tensor, leading to lateral electron-hole separation. We report intersubband absorption covering 1.45 microns to 1.75 microns using Ge-doped quantum wells, with comparable performance to well-studied Si-doped planar heterostructures. We also report comparable intersubband absorption in Si- and Ge-doped nanowire heterostructures indicating that the choice of dopant is not an intrinsic barrier for observing intersubband phenomena. In addition, we calculate the spectral shift of the intersubband absorption due to many body effects as a function of the doping concentration. △ Less

Submitted 8 August, 2017; v1 submitted 11 May, 2017; originally announced May 2017.

Journal ref: A. Ajay et al., Nanotechnology 28, 405204 (2017)

P-i-n InGaN homojunctions (10-40% In) synthesized by plasma-assisted molecular beam epitaxy with extended photoresponse to 600 nm

Authors: S. Valdueza-Felip, A. Ajay, L. Redaelli, M. P. Chauvat, P. Ruterana, T. Cremel, M. Jiménez-Rodríguez, K. Kheng, E. Monroy

Abstract: We report the influence of the In mole fraction on the material and electrical characteristics of p-i-n InxGa1-xN homojunctions (x = 0.10-0.40) synthesized by plasma-assisted molecular-beam epitaxy on GaN-on-sapphire substrates. Junctions terminated with p-InGaN present improved carrier extraction efficiency in comparison with devices capped with p-GaN, due to the deleterious effect of polarizatio… ▽ More We report the influence of the In mole fraction on the material and electrical characteristics of p-i-n InxGa1-xN homojunctions (x = 0.10-0.40) synthesized by plasma-assisted molecular-beam epitaxy on GaN-on-sapphire substrates. Junctions terminated with p-InGaN present improved carrier extraction efficiency in comparison with devices capped with p-GaN, due to the deleterious effect of polarization discontinuities on the device performance. We demonstrate that the presence of Mg does not perturb the In incorporation in InGaN, and it leads to a significant reduction of the stacking fault density. p-In0.3Ga0.7N layers with a hole concentration of 3.2x1018 cm-3 are demonstrated. InGaN homojunction devices show a peak EQE = 14+-2% in the blue-to-orange spectral region, and an extended cutoff to 600 nm. △ Less

Submitted 24 October, 2016; originally announced October 2016.

Ge doping of GaN beyond the Mott transition

Authors: A. Ajay, J. Schörmann, M. Jimenez-Rodriguez, C. B. Lim, F. Walther, M. Rohnke, I. Mouton, L. Amichi, C. Bougerol, M. I. Den Hertog, M. Eickhoff, E. Monroy

Abstract: We present a study of germanium as n-type dopant in wurtzite GaN films grown by plasma-assisted molecular beam epitaxy, reaching carrier concentrations of up to 6.7E20 cm-3 at 300K, well beyond the Mott density. The Ge concentration and free carrier density were found to scale linearly with the Ge flux in the studied range. All the GaN:Ge layers present smooth surface morphology with atomic terrac… ▽ More We present a study of germanium as n-type dopant in wurtzite GaN films grown by plasma-assisted molecular beam epitaxy, reaching carrier concentrations of up to 6.7E20 cm-3 at 300K, well beyond the Mott density. The Ge concentration and free carrier density were found to scale linearly with the Ge flux in the studied range. All the GaN:Ge layers present smooth surface morphology with atomic terraces, without trace of pits or cracks, and the mosaicity of the samples has no noticeable dependence on the Ge concentration. The variation of the GaN:Ge band gap with the carrier concentration is consistent with theoretical calculations of the band gap renormalization due to electron-electron and electron-ion interaction, and Burstein-Moss effect. △ Less

Submitted 8 July, 2016; v1 submitted 1 April, 2016; originally announced April 2016.

Journal ref: Journal of Physics D: Applied Physics 49, 445301 (2016)

Effect of the quantum well thickness on the performance of InGaN photovoltaic cells

Authors: L. Redaelli, A. Mukhtarova, S. Valdueza-Felip, A. Ajay, C. Bougerol, C. Himwas, J. Faure-Vincent, C. Durand, J. Eymery, E. Monroy

Abstract: We report on the influence of the quantum well thickness on the effective band gap and conversion efficiency of In0.12Ga0.88N/GaN multiple quantum well solar cells. The band-to-band transition can be redshifted from 395 to 474 nm by increasing the well thickness from 1.3 to 5.4 nm, as demonstrated by cathodoluminescence measurements. However, the redshift of the absorption edge is much less pronou… ▽ More We report on the influence of the quantum well thickness on the effective band gap and conversion efficiency of In0.12Ga0.88N/GaN multiple quantum well solar cells. The band-to-band transition can be redshifted from 395 to 474 nm by increasing the well thickness from 1.3 to 5.4 nm, as demonstrated by cathodoluminescence measurements. However, the redshift of the absorption edge is much less pronounced in absorption: in thicker wells, transitions to higher energy levels dominate. Besides, partial strain relaxation in thicker wells leads to the formation of defects, hence degrading the overall solar cell performance. △ Less

Submitted 23 February, 2016; originally announced February 2016.

Comments: This is an author-created, un-copyedited version of an article accepted for publication in Applied Physics Letters. The Version of Record is available online at http://dx.doi.org/10.1063/1.4896679

Journal ref: Appl. Phys. Lett. 105, 131105 (2014)

Nonpolar m-plane GaN/AlGaN heterostructures with intersubband transitions in the 5 to 10 THz band

Authors: C. B. Lim, A. Ajay, C. Bougerol, B. Haas, J. Schörmann, M. Beeler, J. Lähnemann, M. Eickhoff, E. Monroy

Abstract: This paper assesses intersubband transitions in the 1 to 10 THz frequency range in nonpolar m-plane GaN/AlGaN multi-quantum-wells deposited on free-standing semi-insulating GaN substrates. The quantum wells were designed to contain two confined electronic levels, decoupled from the neighboring wells. Structural analysis reveals flat and regular quantum wells in the two perpendicular inplane direct… ▽ More This paper assesses intersubband transitions in the 1 to 10 THz frequency range in nonpolar m-plane GaN/AlGaN multi-quantum-wells deposited on free-standing semi-insulating GaN substrates. The quantum wells were designed to contain two confined electronic levels, decoupled from the neighboring wells. Structural analysis reveals flat and regular quantum wells in the two perpendicular inplane directions, with high-resolution images showing inhomogeneities of the Al composition in the barriers along the growth axis. We do not observe extended structural defects introduced by the epitaxial process. Low-temperature intersubband absorption from 1.5 to 9 THz is demonstrated, covering part of the 7 to 10 THz band forbidden to GaAs-based technologies. △ Less

Submitted 16 October, 2015; v1 submitted 1 June, 2015; originally announced June 2015.

Journal ref: Nanotechnology 26, 435201 (2015)

Intersubband transitions in nonpolar GaN/Al(Ga)N heterostructures in the short and mid-wavelength infrared regions

Authors: C. B. Lim, M. Beeler, A. Ajay, J. Lähnemann, E. Bellet-Amalric, C. Bougerol, E. Monroy

Abstract: This paper assesses nonpolar m- and a-plane GaN/Al(Ga)N multi-quantum-wells grown on bulk GaN for intersubband optoelectronics in the short- and mid-wavelength infrared ranges. The characterization results are compared to those for reference samples grown on the polar c-plane, and are verified by self-consistent Schrödinger-Poisson calculations. The best results in terms of mosaicity, surface roug… ▽ More This paper assesses nonpolar m- and a-plane GaN/Al(Ga)N multi-quantum-wells grown on bulk GaN for intersubband optoelectronics in the short- and mid-wavelength infrared ranges. The characterization results are compared to those for reference samples grown on the polar c-plane, and are verified by self-consistent Schrödinger-Poisson calculations. The best results in terms of mosaicity, surface roughness, photoluminescence linewidth and intensity, as well as intersubband absorption are obtained from m-plane structures, which display room-temperature intersubband absorption in the range from 1.5 to 2.9 um. Based on these results, a series of m-plane GaN/AlGaN multi-quantum-wells were designed to determine the accessible spectral range in the mid-infrared. These samples exhibit tunable room-temperature intersubband absorption from 4.0 to 5.8 um, the long-wavelength limit being set by the absorption associated with the second order of the Reststrahlen band in the GaN substrates. △ Less

Submitted 20 April, 2015; originally announced April 2015.

Journal ref: J. Appl. Phys. 118, 014309 (2015)