-
Localisation of hexagonal boron nitride colour centres using patterned dielectric layers on graphene
Authors:
M. K. Prasad,
V. Babenko,
A. W. Tadbier,
S. Hofmann,
J. P. Goss,
J. D. Mar
Abstract:
One of the most promising building blocks for the development of spin qubits, single-photon sources, and quantum sensors at room temperature, as well as 2D ultraviolet light-emitting diodes, are defect colour centres in 2D hexagonal boron nitride (hBN). However, a significant requirement for the realisation of such devices towards scalable technologies is the deterministic localisation of hBN colo…
▽ More
One of the most promising building blocks for the development of spin qubits, single-photon sources, and quantum sensors at room temperature, as well as 2D ultraviolet light-emitting diodes, are defect colour centres in 2D hexagonal boron nitride (hBN). However, a significant requirement for the realisation of such devices towards scalable technologies is the deterministic localisation of hBN colour centres. Here, we demonstrate a novel approach to the localisation of hBN colour centre emission by using patterned dielectric layers grown on graphene via atomic layer deposition (ALD). While colour centre emission is quenched within areas where hBN is deposited directly on graphene due to charge transfer, it is maintained where hBN is deposited on micron-sized Al2O3 pillars which act as barriers to charge transfer. Importantly, our approach allows for device architectures where graphene layers are used as top and bottom electrodes for the application of vertical electric fields, such as for carrier injection in electroluminescent devices, Stark shifting of colour centre emission, and charge state control of defect colour centres. Furthermore, the use of ALD to grow dielectric layers directly on graphene allows for the control of tunnel barrier thicknesses with atomic layer precision, which is crucial for many of these device applications. Our work represents an important step towards the realisation of a wide range of scalable device applications based on the determinsitic localisation of electrically controlled hBN colour centres
△ Less
Submitted 12 March, 2025;
originally announced March 2025.
-
Plasma-enhanced atomic layer deposition of Al$_2$O$_3$ on graphene using monolayer hBN as interfacial layer
Authors:
Barbara Canto,
Martin Otto,
Michael J. Powell,
Vitaliy Babenko,
Aileen O Mahony,
Harm Knoops,
Ravi S. Sundaram,
Stephan Hofmann,
Max C. Lemme,
Daniel Neumaier
Abstract:
The deposition of dielectric materials on graphene is one of the bottlenecks for unlocking the potential of graphene in electronic applications. In this paper we demonstrate the plasma enhanced atomic layer deposition of 10 nm thin high quality Al$_2$O$_3$ on graphene using a monolayer of hBN as protection layer. Raman spectroscopy was performed to analyze possible structural changes of the graphe…
▽ More
The deposition of dielectric materials on graphene is one of the bottlenecks for unlocking the potential of graphene in electronic applications. In this paper we demonstrate the plasma enhanced atomic layer deposition of 10 nm thin high quality Al$_2$O$_3$ on graphene using a monolayer of hBN as protection layer. Raman spectroscopy was performed to analyze possible structural changes of the graphene lattice caused by the plasma deposition. The results show that a monolayer of hBN in combination with an optimized deposition process can effectively protect graphene from damage, while significant damage was observed without an hBN layer. Electrical characterization of double gated graphene field effect devices confirms that the graphene did not degrade during the plasma deposition of Al$_2$O$_3$. The leakage current densities were consistently below 1 nA/mm for electric fields across the insulators of up to 8 MV/cm, with irreversible breakdown happening above. Such breakdown electric fields are typical for Al$_2$O$_3$ and can be seen as an indicator for high quality dielectric films.
△ Less
Submitted 24 August, 2022;
originally announced August 2022.
-
Oxidising and carburising catalyst conditioning for the controlled growth and transfer of large crystal monolayer hexagonal boron nitride
Authors:
Vitaliy Babenko,
Ye Fan,
Vlad-Petru Veigang-Radulescu,
Barry Brennan,
Andrew J. Pollard,
Oliver Burton,
Jack A. Alexander-Webber,
Robert S. Weatherup,
Barbara Canto,
Martin Otto,
Daniel Neumaier,
Stephan Hofmann
Abstract:
Hexagonal boron nitride (h-BN) is well-established as a requisite support, encapsulant and barrier for 2D material technologies, but also recently as an active material for applications ranging from hyperbolic metasurfaces to room temperature single-photon sources. Cost-effective, scalable and high quality growth techniques for h-BN layers are critically required. We utilise widely-available iron…
▽ More
Hexagonal boron nitride (h-BN) is well-established as a requisite support, encapsulant and barrier for 2D material technologies, but also recently as an active material for applications ranging from hyperbolic metasurfaces to room temperature single-photon sources. Cost-effective, scalable and high quality growth techniques for h-BN layers are critically required. We utilise widely-available iron foils for the catalytic chemical vapour deposition (CVD) of h BN and report on the significant role of bulk dissolved species in h-BN CVD, and specifically, the balance between dissolved oxygen and carbon. A simple pre-growth conditioning step of the iron foils enables us to tailor an error-tolerant scalable CVD process to give exceptionally large h-BN monolayer domains. We also develop a facile method for the improved transfer of as-grown h-BN away from the iron surface by means of the controlled humidity oxidation and subsequent rapid etching of a thin interfacial iron oxide; thus, avoiding the impurities from the bulk of the foil. We demonstrate wafer-scale (2 inch) production and utilise this h-BN as a protective layer for graphene towards integrated (opto) electronic device fabrication.
△ Less
Submitted 26 November, 2020;
originally announced November 2020.
-
Wide-field spectral super-resolution mapping of optically active defects in hBN
Authors:
Jean Comtet,
Evgenii Glushkov,
Vytautas Navikas,
Jiandong Feng,
Vitaliy Babenko,
Stephan Hofmann,
Kenji Watanabe,
Takashi Taniguchi,
Aleksandra Radenovic
Abstract:
Point defects can have significant impacts on the mechanical, electronic and optical properties of materials. The development of robust, multidimensional, high-throughput and large-scale characterization techniques of defects is thus crucial, from the establishment of integrated nanophotonic technologies to material growth optimization. Here, we demonstrate the potential of wide-field spectral sin…
▽ More
Point defects can have significant impacts on the mechanical, electronic and optical properties of materials. The development of robust, multidimensional, high-throughput and large-scale characterization techniques of defects is thus crucial, from the establishment of integrated nanophotonic technologies to material growth optimization. Here, we demonstrate the potential of wide-field spectral single-molecule localization microscopy (spectral SMLM) for the determination of ensemble spectral properties, as well as characterization of spatial, spectral and temporal dynamics of single defects in CVD-grown and irradiated exfoliated hexagonal boron-nitride (hBN) materials. We characterize the heterogeneous spectral response of our samples, and identify at least two types of defects in CVD-grown materials, while irradiated exfoliated flakes show predominantly only one type of defect. We analyze the blinking kinetics and spectral emission for each type of defects, and discuss their implications with respect to the observed spectral heterogeneity of our samples. Our study shows the potential of wide-field spectral SMLM techniques in material science and paves the way towards quantitative multidimensional mapping of defect properties.
△ Less
Submitted 18 March, 2019; v1 submitted 21 January, 2019;
originally announced January 2019.